P-Type Ohmic Contact to Monolayer WSe2 Field-Effect Transistors Using High-Electron Affinity Amorphous MoO3

Abstract

Monolayer tungsten diselenide (1L-WSe2) has been widely used for studying emergent physics due to the unique properties of its valence bands. However, electrical transport studies have been impeded by the lack of a reliable method to realize Ohmic hole-conducting contacts to 1L-WSe2 especially at low carrier densities and low temperatures. Here, we report low-temperature p-type Ohmic contact to 1L-WSe2 field-effect transistors at carrier densities (n) below n = 1 × 1012 cm–2 with negligible temperature dependence down to the lowest measured temperature (10 K). The non-rectifying barrier is achieved between 1L-WSe2 and molybdenum trioxide (MoO3), where 1L-WSe2 underneath MoO3 is heavily hole-doped through surface transfer doping. Electrical transport measurements reveal linear current–voltage relations at a temperature of 10 K and carrier densities from n = 7.7 × 1011 cm–2 to below the threshold. The finding is also supported by nearly temperature-independent output curves up to room temperature and a negligible contact barrier down to the subthreshold regime. Furthermore, the contact resistivity of MoO3-contacted 1L-WSe2 FET is 30.2–64.8 kΩ μm at n = 1.5 × 1012 cm–2, which is the lowest reported for 1L-WSe2 FETs at such low carrier density. Realizing robust p-type Ohmic contact to a 2D transition metal dichalcogenide semiconductor will enable direct electronic measurements of quantum transport in correlated phases in the valence bands of monolayer semiconductors.