Abstract
Target Mura occurs in sputter using separated target at IGZO deposition. This study was evaluated to improve the problem of poor panel quality and reliability for Target Mura. To improve OLED panel quality of a‐IGZO TFT we have been optimized the sputter deposition method and the annealing process of IGZO/Gate Insulator layer. Improved panel quality by completely eliminating sputter target mura and we achieved to highly reliability in Image Sticking. Also, we achieved that the uniformity of threshold voltages of a‐IGZO TFTs on Gen. 8.5 glass is approximately 0.77V by using optimized TFT process. In addition, improved top gate IGZO TFTs backplane of the 55 inch 4K UHD OLED TV could be demonstration.
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