P‐55: Development of Photosensitive Material for Mini/MicroLED Displays

Abstract

We developed photosensitive material for Mini/Micro LED display. The material is negative tone type and alkaline developable. Minimum resolution of the material is 10 μm with 10 μm thickness, and taper angle is approximately 80°. The material has high transparency and good heat resistance. Transparency of 10 μm thickness cured film is more than 90% at 400 nm, Tg of cured film is over 250°C. And the material has durability against blue light (405 nm). After radiation of blue light at 50°C for 400 hrs, the material has no transparency loss and no film thickness loss.