Abstract
We introduce in‐situ ultraviolet ozone(UVO) patterning technique to selectively attach the Poly‐L‐Lysine(PLL) material, which ultimately patterns the solution‐processed and directlydeposited random networks of single‐walled carbon nanotube(SWCNT). Furthermore, we demonstrated feasibility and applicability of our technique by implementing 16 devices on SiO2 substrate and all‐solution‐processed logic inverter circuit at organic dielectric.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
