P‐148: Inspection of Excimer‐Laser Annealed Thin Silicon Films Across the Length Scale of Interest

Abstract

Comprehensive evaluation of the microstructure obtained by excimer‐laser annealing of thin silicon films may be performed using in‐line electron beam review (EBR). Detailed macroscopic evaluation of the uniformity thereof may be achieved with the crystallization monitor (CM). Here, we present how these methods can be used in a complementary way thereby offering an inspection solution covering the whole length scale of interest.