Abstract
The pure anatase structured TiO2 thin film was coated uniformly on the well‐arrayed ZnO nanorods by mist CVD method. The surface area of arrayed ZnO nanorods was increased significantly by TiO2 thin film coating. It was found the obtained TiO2 film could be fabricated well with high thermal stability. The mechanism of the TiO2 thin film deposition in mist CVD methods and the interface between TiO2 and ZnO nanorods were investigated.
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