Abstract
The photonic device market has a need for low‐cost, high‐resolution periodic patterning that scales with product maturity to large substrate sizes. Eulitha's DTL (Displacement Talbot Lithography) technology was limited to only a single exposure field per substrate on preexisting platforms which can fully pattern 100 and 150mm substrates. The new ‘PhableS' is Eulitha's step‐and‐repeat solution to bring all the advantages of the DTL patterning to larger substrates.The PhableS tool builds on Eulitha's patented displacement Talbot lithography technology to open the way for customers to fully scale to high volume production. This tool retains the strong technical performance; including 60nm half pitch resolution (DUV version), 140x140mm2 single shot exposure field, large depth of focus (hundreds of microns), high throughput (+40wph), non‐contact, mask‐based patterning. Automated wafer and mask handling support industry expected repeatability and defect‐free patterning.
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