Abstract
We grow high-quality two-dimensional hexagonal boron nitride (h-BN) films on copper pockets by chemical vapor deposition. A piece of sapphire embedded in the pocket serves as an oxygen supply during the growth process. To obtain clean h-BN films, source powders are placed in a U-shaped quartz tube and heated up in a water bath without the carrier-gas flow. These films are characterized by using SEM, Raman, XPS, and selected area electron diffraction analyses. As dielectric substrates, h-BN films significantly enhance the charge-carrier mobility of graphene transistors. This facile and robust method can be a scalable approach to synthesize large-area high-quality h-BN films for related electronic applications.
Published Version
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