Abstract
The chemisorption of oxygen on the Al(111) surface was studied at 300–773K using X-ray photoelectron and high resolution electron energy loss spectroscopies. It was shown that extreme levels of Ar+ bombardment and annealing pretreatment were necessary to prepare a surface with reproducible O2 adsorption behavior. The rate of oxygen adsorption was decreased after such a treatment. It is postulated that extensive bombardment/annealing yields a surface with a small number of defect sites. Predominantly chemisorbed O islands are formed even upon 300L oxygen adsorption on this low defect density surface. These islands transform into oxide with time (at 300K) and increasing surface temperature (T=470–500K), producing a vibrational mode around 820–865cm−1, characteristic of the oxide formation. Additional evidence for the assignment of this mode to the oxidic species is obtained from the experiments, where O+2 ion implantation or Ar+ bombardment of a chemisorbed O layer were performed. The final oxide film produced after annealing of adsorbed O up to ∼600–650K exhibits vibrational modes at ca 400, 610 and 850cm−1, in agreement with prior results.
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