Abstract
Depositing TiN Film on the surface of 4Cr5MoSiV1 with multi-arc ion plating technology method. And 350°C, 450°C, 550°C and 650 °C short oxidation test and 550 °C cyclic oxidation test. By scanning electron microscopy (SEM) and electron spectrometry (EDS) to analysis micro-structure and phase structure of test samples, study TiN film on oxidation resistance, and utilize indentation method to measure mechanical properties. Results show: In a short time under oxidizing conditions, at 550 °C the TiN film still has a good oxidation resistance. The film still have a sufficient bonding strength below 600 °C.
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