Abstract
Oxides are formed on InP substrates under UV/ozone illumination. The thickness of the formed oxides increases as the exposure time to the UV source increases, and tends to saturate after three hours of exposure. The optical transmission and X-ray diffraction measurements predict the formation of the oxide layer. X-ray diffraction shows that the oxide film is a mixture of In2O3 and InPO4 and seems to be In2O3-rich. The integrated absorption coefficient of the formed oxide layer does not depend on the wavelengths in the range of 800–1400 nm, and is found to be in the order of 107 cm-1. The reflections from the sample surface after UV/ozone oxidation at different exposure times are also measured.
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