Abstract
AbstractWe report several combinations of chemical preparation procedures for selective cleaning of InP (100) surfaces in connection with storage procedures. A complex of analytical methods was used to get information about the surface state, the morphology, and the perfection of the surface. Using a standard etch procedure developed by KURTH et al. a post‐deoxidation by small concentrated HF or HNO3 is sufficient to get oxide‐free, clean InP (100) surfaces even after a storage in methanol for some hours.
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