Abstract
Kinetic studies of the partial oxidation of CH4 over Sm2O3 using N2O and O2 as oxidants have been carried out at 823–950 K and the kinetic features in the reactions with N2O and O2 have been compared. At a low temperature (823 K) and a pressure of the oxidants of 3–13 kPa, the oxidation by N2O produced C2H6 with high selectivity, but only deep oxidation took place when O2 was used as the oxidant. However, C2H6 was observable when the pressure of O2 was lowered below 1kPa. The reactivity of O2 was two orders of magnitude greater than that of N2O. O2 is a better oxidant than N2O for the production of C2 compounds. A reaction mechanism for the oxidation of CH4with N2O is proposed. Kinetic studies of the reaction have shown that N2O decomposition is rate-determining. Kinetic studies of the oxidation with O2 have confirmed the reaction mechanism proposed previously.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
