Abstract

In this study, Cr–Ta–Si–N coatings were prepared using reactive magnetron co-sputtering on silicon wafers and cemented carbide substrates to evaluate their feasibility for protective purposes on glass molding dies. The nitrogen gas flow-rate ratio (N2/(N2+Ar)) was set at 0.4 to fabricate the Cr–Ta–Si–N coatings with an overstoichiometric ratio, N/(Cr+Ta+Si)>1, for the rock salt structure. The as-deposited Cr–Ta–Si–N coatings, with Cr and Si contents in the ranges of 1–15at.% and 9–15at.%, respectively, exhibited a nanohardness of 14.6–21.6GPa and a surface roughness of 0.4–1.0nm. The coatings with a Si content between 11 and 15at.% exhibited X-ray amorphous. Annealing treatments were conducted in a 1% O2–99% Ar atmosphere at 600°C for 500min, which is an oxidation-accelerating condition, and thermal cycling annealing was conducted at 270°C and 600°C in a 15ppm O2–N2 atmosphere, which is a realistic glass molding atmosphere for mass production. The outward diffusion of Si resulted in the formation of a Si-oxide scale 12–14nm thick, thus maintaining a surface roughness of approximately 1nm and confirming the thermal stability of the Cr–Ta–Si–N coatings. The chemical inertness of the Cr6Ta25Si11N58 coating during the molding of B2O3–ZnO–La2O3-based and SiO2–B2O3–BaO-based glasses was evaluated.

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