Abstract
All the coatings and multilayer structures were deposited in a Sputron plasma-beam-sputtering apparatus at a temperature below 150 °C on polished alumina substrates ( R a= 25 nm) and polished tool steel discs. The coatings were annealed in an oxygen flow at temperatures in the range 500–850 °C. The oxidation kinetics of these coatings were studied by means of the weight gain as a function of the oxidation time at each temperature. On the same coatings, continuous in situ electrical resistivity measurements were taken and these indicate grain boundary oxidation. The composition and the depth profiles of the oxidation products formed were investigated using AES and XPS combined with sputter profiling. The oxide layers were found to grow according to a parabolic diffusion law with activation energies of 1.04, 1.89, 1.92, 2.37,2.91 and 3.98 eV for Ti 0.63Zr 0.37N, TiN, CrN, ZrN, TiN/CrN and Cr 0.72Ti 0.28N, respectively.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
