Abstract
The high chemical reactivity of epitaxial silicene on Ag(111) still remains a debated subject in the literature. In particular results on the oxidation of epitaxial silicene and its related lifetime under ambient conditions are controversially discussed. Here, a detailed investigation of the oxygen exposure to epitaxial silicene layers investigated by means of X‐ray photoemission and in situ Raman spectroscopy is reported. The results should clearly cease the discussion on the stability of epitaxial silicene against oxygen as it becomes completely oxidized after an exposure to only 100 L of oxygen. Such a small dose sets strict limits for ex situ studies of epitaxial silicene. Besides the formation of silicon oxide also the silver substrate surface oxidizes, suggesting that the silicene layer can hardly protect it, probably owing to the high number of domain boundaries within the silicene layer.
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