Abstract
Tantalum (Ta) alloys are important ultra-high-temperature structural materials owing to their excellent high-temperature mechanical properties and processability. However, they exhibit poor high-temperature oxidation resistance. In this study, a dense MoSi2 ceramic coating was prepared on a Ta substrate using an innovative multi-arc ion plating process and halide activated pack cementation in order to improve its ultra-high-temperature oxidation resistance. This ceramic coating exhibited a low roughness space arithmetic (287.1 ± 26.3 nm) and a dense structure. The relationship between the thickness of the coating and the duration of pack-cementation at 1250 ℃ was parabolic. The coating had a service life of more than 12 h at 1750 ℃, and showed excellent high-temperature oxidation resistance because of the uniform and dense structure of the coating and the rapid formation of a dense SiO2 layer with low O2 permeability during high-temperature oxidation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
