Abstract
TaSiN coatings with a Si content of 19–21at.% were fabricated through reactive direct current magnetron cosputtering; the sputter power was set at 100W for each target, and the coatings were X-ray amorphous in the as-deposited state. The N contents of the TaSiN coatings increased from 31 to 47at.% as the N2/(N2+Ar) flow ratio was increased from 0.1 to 0.4; additionally, nanoindentation hardness decreased from 20 to 14GPa, and the Young's modulus decreased from 220 to 196GPa. The oxidation resistance of the TaSiN coatings was evaluated through annealing at 600°C and 800°C in ambient air, which revealed notable oxidation resistance related to the TaN coatings. The oxidation behavior of the X-ray amorphous TaSiN coatings was examined through transmission electron microscopy and X-ray photoelectron spectroscopy.
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