Abstract
Boron was incorporated into the MoSi2 coating via BSi co-cementation and a two-step process, i.e., boronizing followed by siliconizing. Compositional and microstructural changes arising from B-doping remarkably improved the performance of the MoSi2 coating. At 600 °C, compositional change caused by B-doping led to the formation of borosilicate scale with lower viscosity relative to vitreous SiO2, which considerably enhanced the oxidation resistance. However, the pores that formed within the middle and lower part of the B-doping MoSi2 coatings during preparation had a negative effect on the development of a continuous borosilicate scale. At 1400 °C, the interfacial reaction between MoB and Mo5Si3 led to the formation of a continuous Mo5SiB2 interlayer, which delayed the inward diffusion of Si within the coating. Accordingly, the growth rate of Mo5Si3 was roughly halved.
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