Abstract
Funded by the New Energy and Industrial Technology Development Organization, the Millennium Research for Advanced Information Technology Project (MIRAI) provided technology solutions for the half-pitch 65nm technology node in its 1st Phase (2001-2003), and half-pitch 45nm and beyond in its 2nd Phase(2004-2007). Phase 3 will provide technical solutions for ultrascaled CMOS, nano-silicon integration and EUV lithography.
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