Abstract
Funded by the New Energy and Industrial Technology Development Organization, the Millennium Research for Advanced Information Technology Project (MIRAI) provided technology solutions for the half-pitch 65nm technology node in its 1st Phase (2001-2003), and half-pitch 45nm and beyond in its 2nd Phase(2004-2007). Phase 3 will provide technical solutions for ultrascaled CMOS, nano-silicon integration and EUV lithography.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
