Abstract

We review the recent progress to achieve air stable III-nitride photocathodes for applications as photon detectors. High conductivity <i>p</i>-type films are critically important to realize high quantum efficiency (QE) photocathodes with effective negative electron affinity (NEA) and downward surface band bending with narrow surface depletion width. Initial reports of III-nitride photocathodes utilize a Cs-surface activation to achieve effective NEA. To attain air stable, Cs-free photocathodes, novel energy band engineering has been shown using Si delta-doping and an <i>n</i><sup>&#x002B;</sup>-GaN cap on the surface of a Ga-polar <i>p</i>-GaN layer. Improvement of QE has been achieved utilizing the N-polarity of III-nitrides due to advantageous depletion and polarization charges at the surface. High QE &gt; 25&#x0025; has been demonstrated by improvements in <i>p</i>-type conductivity with improved Mg-dopant incorporation in N-polar hillock structures and by control over unintentional impurity incorporation and distribution. Further, the importance of achieving high <i>p</i>-type conductivity films is further shown through reviewing recent simulations of GaN photocathodes with varied band bending and hole concentrations. Through comparison of experimental photoemission with Monte Carlo simulations, band structure parameters such as electron effective mass in the conduction band valleys have been elucidated.

Highlights

  • III-nitride photodetectors are technologically significant devices, harnessing the wide and tunable band gap of the material system for photon detection of wavelengths spanning from infrared to ultra-violet [1]–[3]

  • Photocathodes are commonly employed in photomultiplier tubes (PMTs) or in arrayed detectors such as microchannel plate (MCP) detectors, and electron bombarded charge coupled device (EBCCD) detectors [2]

  • The experimental and theoretical studies discussed in this review emphasize the imperative to control the electrostatic profile of photocathode devices

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Summary

PJ-012629-2021

Overview and progress toward high-efficiency, air stable, Csfree III-nitride photocathode detectors. Abstract— We review the recent progress to achieve air stable III-nitride photocathodes for applications as photon detectors. High conductivity p-type films are critically important to realize high quantum efficiency (QE) photocathodes with effective negative electron affinity (NEA) and downward surface band bending with narrow surface depletion width. Initial reports of III-nitride photocathodes utilize a Cs-surface activation to achieve effective NEA. Cs-free photocathodes, novel energy band engineering has been shown using Si delta-doping and an n+-GaN cap on the surface of a Gapolar p-GaN layer. The importance of achieving high p-type conductivity films is further shown through reviewing recent simulations of GaN photocathodes with varied band bending and hole concentrations.

INTRODUCTION
CS-ACTIVATED GA-POLAR GAN PHOTOCATHODES
CS-FREE GA-POLAR III-NITRIDE PHOTOCATHODES
CS-FREE N-POLAR III-NITRIDE PHOTOCATHODES
Surface treatments
Impact of N-polar hillock structures
Impurity incorporation in N-polar photocathodes
MONTE CARLO SIMULATIONS OF PHOTOCATHODES
COMPARISON OF CS-ACTIVATED AND CS-FREE GAN PHOTOCATHODES
Findings
CONCLUSION AND OUTLOOK
Full Text
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