Abstract
Abstract Low-energy electron diffraction has been used to measure the spacing between monolayers of Ar or Kr and the outermost basal plane of a graphite substrate. The intensity of the (00) beam is recorded as a function of energy for graphite with and without the overlayer present. Using the analysis method of Cohen, Unguris and Webb, we find that the ratio of the two intensity curves shows an oscillation whose period is inversely proportional to the desired spacing. For Ar, we find a value of 3.2 ± 0.1 A at 42 K. The results for Kr are somewhat ambiguous but suggest a value of 3.3 ± 0.1 A at 52 K.
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