Abstract
In this work, we report highly uniform growth of template-assisted electrodeposited copper nanowires on a large area by lowering the deposition temperature down to subzero centigrade. Even with highly disordered commercial porous anodic aluminum oxide template and conventional potentiostatic electrodeposition, length uniformity over 95% can be achieved when the deposition temperature is lowered down to -2.4°C. Decreased diffusion coefficient and ion concentration gradient due to the lowered deposition temperature effectively reduces ion diffusion rate, thereby favors uniform nanowire growth. Moreover, by varying the deposition temperature, we show that also the pore nucleation and the crystallinity can be controlled.
Highlights
Length uniformity in template-assisted electrodeposited nanowires is of great importance in realizing the nanowires as building blocks for various technological applications that involve electron flow through the nanowires such as thermoelectric [1,2], spintronics [3,4], photovoltaics [5], interconnects [6,7], and phasechange memory devices [8]
The results show that the temperature does not critically affect the Cu reduction potential which is in good agreement with previous study [24]
Mentioning the electrodeposition stages are: (1) charging of electric double layer and subsequent development of diffusion layer at the vicinity of the surface of the working electrode which leads to an instantaneous rise and drop of the initial current density; (2) growth of nanowires inside the template where the current density remains steady; (3) overgrowth of the nanowires after reaching the pore end which leads to gradual increase of the current density due to the increase of the electrodepositing area
Summary
Length uniformity in template-assisted electrodeposited nanowires is of great importance in realizing the nanowires as building blocks for various technological applications that involve electron flow through the nanowires such as thermoelectric [1,2], spintronics [3,4], photovoltaics [5], interconnects [6,7], and phasechange memory devices [8]. We report highly uniform growth of templateassisted electrodeposited copper (Cu) nanowires by lowering the deposition temperature down to subzero centigrade. The ion diffusion rate, which directly influences the electrodeposition behavior thereby length uniformity, can be appropriately controlled by varying the deposition temperature.
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