OS2-2-4 集束イオンビーム化学気相成長法による空中水平長尺ナノ構造形成(OS2 三次元の微細形状創成技術(2))

Abstract

Focused-ion-beam chemical vapor deposition (FIB-CVD) is a key technology to achieve the arbitrary three-dimensional (3D) nano- and microstructure fabrication. It has been demonstrated of free-space-nanowiring, which enables the fabrication of various innovative devices with overhanging structures. However, due to the inhomogeneous distribution of source gas density, and the accumulation of heat and electric charge on nanostructure, it is difficult to fabricate ultra-long free-space-nanowire with a constant growth angle. Usually, the free-space-nanowire deviates downward from the starting angle after growing several micrometers long. And also, it was noted that the intensity of substrate current and secondary electrons (SEs) depends on the growth angle of nanowire. This growth angle dependency is useful to monitor the growth shape during fabrication. In this study, we developed a technology to fabricate ultra-long free-space-nanowire with a length more than 10 μm by real-time monitoring the substrate current and feedback controlling the scanning speeds of FIB during the fabrication.