Abstract

We evaluated the oxygen reduction reaction (ORR) properties of ultra-thin Pt shell layers prepared on nitrogen ion beam (N2 + beam), and neutralized nitrogen ion beam (N2 0 beam) irradiated Pt25Ni75(111) substrates. Although the non-N2 irradiated 0.9-nm-thick Pt layers on Pt25Ni75(111) (Pt0.9nm/Pt25Ni75(111)) showed a kinetic-controlled current density (j k) of 7.7 mA/cm2, the j k values for the Pt0.9nm/N2 +–Pt25Ni75(111) and Pt0.9nm/N2 0–Pt25Ni75(111) pristine surfaces are 6.6 and 6.3 mA/cm2, respectively. In contrast, the N2 0 beam irradiated sample displayed better durability by retaining ca. 90% of the initial j k value, while the j k values for the N2 + irradiated and non-irradiated samples decreased to ca. 70% and 60%, respectively, of the initial value. The result suggests that N2 0 beam irradiation on the Pt25Ni75(111) substrate is effective for the electrochemical stabilization of the ultra-thin Pt-shell layers.

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