Abstract
The surface morphology, thin film microstructure, and crystallography of sputtered longitudinal media were examined by atomic force and transmission electron microscopy. It was found that surface features along the texture lines in addition to the line density affect the measured orientation ratio. In addition, c-axis alignment along the texture line direction was established. These results point to magnetocrystalline anisotropy associated with the c axis as a major contributor to a high orientation ratio in these materials.
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