Origin of Monochromatic Electron Emission From Planar-Type Graphene/ h -BN/ n -Si Devices

Abstract

We previously reported highly monochromatic electron emission from the planar-type electron emission devices based on a graphene/hexagonal boron nitride (h-BN) heterostructure. In this paper, the electron energy distribution (EED) of these devices is examined to clarify the mechanism of monochromatic electron emission. We find that the monochromaticity of the electron beam depends significantly on the electronic structure of the substrate material; for the devices with an n-type silicon substrate, the narrowest FWHM of the electron beam is 0.18 eV, whereas that of devices with a metallic (Nb) substrate is 0.33 eV. At the same time, simulations considering the electron scattering by phonons acceptably reproduced the shape of each EED spectrum considering the small energy loss due to out-of-plane acoustic phonon modes in h-BN. Thus, the monochromatic electron emission from the $\mathrm{graphene}/h$-$\mathrm{BN}/n$-$\mathrm{Si}$ device is ascribed to a combination of the narrow energy distribution of electrons at the conduction band of the n-$\mathrm{Si}$ substrate and small phonon energy of the h-BN insulating layer. These features also realize the excellent emission properties in addition to the monochromaticity of the beam, such as a high emission current density of $9.3{\mathrm{A}/\mathrm{cm}}^{2}$, insensitivity to environmental pressure up to 10 Pa, and long lifetime of more than 7 days with little decay.