Origin of microwave noise from an n-channel metal–oxide–semiconductor field effect transistor

Abstract

The physics of noise is a complex subject. It is often difficult to clearly identify the physical origin of the observed noise. Electronic noise at microwave frequencies is technologically very important and has been extensively studied. While it is well known that many physical phenomena give rise to output current fluctuations (i.e., noise) in a metal–oxide–semiconductor field effect transistor (MOSFET), few physical phenomena have a time constant that can contribute in the microwave range. Current physical models of MOSFET microwave noise are all based on thermal agitation of electrons (thermal noise). However, what is the correct temperature (lattice or electron) to use in the noise calculation is an ongoing debate in the literature. All the modeling efforts have been using noise measured from pristine devices as a test for validity. In this work, we studied the n-MOSFET microwave noise as a function of electrical stress induced degradation. Our experiments thus introduced a new dimension in the noise behavior study. The results of our experiments cannot be explained by any of the current existing models. All existing models discounted flicker noise as being too small at microwave frequency. Our experimental results compel us to reexamine the validity of this common assumption. While we are not quite able to prove conclusively, our evidences are clearly leaning toward defect-induced fluctuation (flicker noise) as the origin of microwave noise in a n-MOSFET