Abstract
The interaction of deposited metals with monolayer films is critical to the understanding of, and ultimate utility of, the emerging arena of molecular electronics. We present the results of a thorough study of the interaction of vapor-deposited Au and Ag on alkane films attached to Si substrates. Two distinct categories of films are studied: C18 films formed from the hydrosilation reaction of octadecyl trichlorosilane with thin SiO2 layers and C18 films formed from the direct attachment of functionalized alkanes with hydrogen-terminated Si. Two direct attachment chemistries were studied: (Si)3−Si−O−C linkages of 1-octadecanol and octadecanal on H-terminated Si(111) and (Si)3−Si−C linkages of 1-octadecene on H-terminated Si(111). The reactivity of the films was studied with p-polarized backside reflection absorption spectroscopy (pb-RAIRS), sputter depth profiling X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry (SE), atomic force microscopy (AFM), and device electrical tests. Independe...
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