Abstract
Abstract : A new method of orienting crystalline (anisotropic) overlayers on an amorphous substrate by surface relief structures on the substrate has been analyzed and demonstrated. New submicrometer fabrication techniques has to be developed in order to demonstrate the orientation effect. These techniques may have broad application in the field of microelectronics and integrated optics as well as in the work presented here. It is believed that the models and demonstrations of overlayer orientation presented here are but a first step in what will be an exciting new field of investigation. In essence, a new degree of freedom has been introduced in the science and technology of surfaces and thin- film growth.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
