Organometallic chemical vapor phase deposition of “Mn 2Si”

Abstract

We have deposited Mn 2Si films on nickel foils by the pyrolysis of the organometallic complex Mn 2(CO) 10(μ-SiH 2). These films have been subsequently studied by Rutherford backscattering spectrometry (RBS) and are observed to be isotropic. Scanning electron microscopy and X-ray diffraction indicate that the deposition rate is rapid and results in the formation of amorphous films. The RBS results, as well as depth profiling using Auger electron spectroscopy, demonstrate that the films formed by the vapor phase pyrolysis of this metal carbonyl silyl complex have a stoichiometric ratio of manganese to silicon that is well preserved at 2:1 for substrate deposition temperatures above 300°C.