Abstract
• PIMs with outstanding performance can be developed for advanced OSN membranes. • Crosslinked PIM-based membranes enhance stability and enable control of membrane properties. • The molecular weight cut-off for organic solvent nanofiltration membranes is 200–800 g mol −1 . • Investigations on physical aging, solvent resistance, and varying porosity are required. • Thermal annealing and carbonization of PIM membranes may lead to high solvent and swelling resistance. High-performance polymer membranes have attracted attention as excellent candidates for the fabrication of separation materials owing to their high versatility and ease of processability. Membranes can be prepared from polymers through solvent evaporation, phase inversion, coating, or interfacial polymerization. Organic solvent nanofiltration (OSN) processes require membranes with high solvent resistance, excellent thermal and chemical stability, and high separation performance. Polymer membranes have shown great potential in OSN for separating valuable pharmaceutical compounds, dyes, and other organic molecules within a molecular weight range of 100–2000 g mol −1 in organic solvents. Polymers of intrinsic microporosity (PIMs) have been used to fabricate OSN membranes with outstanding thermal and chemical stability in addition to high intrinsic porosity. In this study, we discuss different design aspects that should be considered for achieving high performance in advanced PIM-based OSN membranes operating under harsh conditions.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.