Abstract

Two-dimensional silica colloidal crystal template is used to create metal nanohole arrays on a silicon surface, which enables the controlled fabrication of aligned silicon nanowire (SiNW) arrays via metal catalytic etching. By varying the size of silica colloidal crystals, aligned arrays of SiNWs with desirable diameter and density could be obtained. The formation of ordered SiNW arrays is due to selective and anisotropic etching of silicon induced by the silver pattern. The orientation of SiNW arrays is influenced by silver movement in silicon, and the wire axes are primarily along the ⟨100⟩ direction.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.