Abstract
Abstract Silica with well-ordered line patterns and a periodicity of approximately 30 nm was prepared by the calcination of a block copolymer with polyhedral oligomeric silsesquioxane (POSS) as a template. A POSS-containing block copolymer was prepared via living anionic polymerization. The thin film of the block copolymer exhibited linear features upon CS2 vapor annealing. Cylindrical structure changed to a line morphology during calcination process.
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