Abstract
The fabrication methods and physical properties of ordered magnetic nanostructures with dimensions on the submicron to nanometer scale are reviewed. First, various types of nanofabrication techniques are described, and their capabilities and limitations in achieving magnetic nanostructures are discussed. Specifically, we address electron beam lithography, X-ray lithography, laser interference lithography, scanning probe lithography, step growth methods, nanoimprint, shadow masks, radiation damage, self-assembled structures, and the use of nanotemplates. Then the magnetic properties of these nanostructures are reviewed, including properties of single dots, magnetic interactions in arrays, dynamic effects, magnetic behavior of nanostructured lines and wires, giant magnetoresistance effect, and properties of films with arrays of holes. Finally, the physical properties in hybrid systems, where the magnetic arrays interact with superconducting and semiconducting layers, are summarized.
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