Abstract
AbstractBoth undoped and Cu2+-doped TiO2 films have been prepared by sol-gel dip-coating method and characterized by UV-Vis, FTIR, and PL spectroscopy. Also, SEM images of the prepared films were to taken to analyze the surface morphology. Finally, the optoelectronic characterization of the prepared Cu2+-doped films have been performed using I–V measurements under two different light conditions. The surface plasmon resonance (SPR) bands of copper have been observed between 500 and 600 nm. Also, the variation of current under white light illumination was found to much more prominent at a particular voltage than that of dark current.KeywordsSurface Plasmon ResonanceTiO2 FilmSurface Plasmon Resonance BandTitanium IsopropoxideWhite Light IlluminationThese keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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