Abstract
With the development of nanotechnology, emerging nanotechniques compel dramatically increasing demands on nanostructures’ fabrication. As an important three-dimensional micro/nanostructures’ fabrication method, direct laser writing has been widely applied in various modern scientific technological fields. To realize three dimensional micro/nanostructures, dual-beam super-resolution direct laser writing technique, combined with two-photon polymerization (TPP) method and stimulated emission depletion (STED) principle, has successfully realized resolution beyond optical diffraction limit, and uphold exceptional 3D nanofabrication scheme. The principle of dual-beam super-resolution laser direct writing and recent progress in improving line width and resolution have been demonstrated in the review. We have also summarized emerging applications of dual-beam super-resolution laser direct writing in relevant fields. Eventually, challenges in how to fulfill low-cost, high efficiency, large area and multi-functional materials’ fabrication and its future development are discussed.
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