Optoelectrical Properties of HgCdTe Epilayers Grown by Hot Wall Epitaxy

Abstract

<TEX>$Hg_{1-x}Cd_{x}Te$</TEX> (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of <TEX>$590^{\circ}C$</TEX> for 15 min. When the thickness of the CdTe buffer layer was <TEX>$5{\mu}m$</TEX> or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111)/GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.