Optimizing the design of transparent conductive substrates

Abstract

The requirements for transmittance, sheet resistance, and flexibility in transparent conductive substrates vary with the product application. In this study, a double-sided, antireflective design was used to enhance the overall transmittance of various highly transparent conductive substrates. ITO–SiOx nano-multilayer (NML) structures were used to create transparent conductive films with low refractive indices, while ITO–Ag NML structures were used to achieve low resistivity (<10−4 Ω cm) and tunable transmittance. The authors employed rotational, sequential sputtering for the preparation of dense NML structures followed by rapid thermal annealing to enhance the moisture resistance of the ITO/Ag/ITO transparent conductive films. The results of this study showed that the ITO conductive glass substrates designed for high transmittance could produce a sheet resistance below 200 Ω/□ with an average light transmittance exceeding 95% in the visible spectrum and more than 98% at a wavelength of 550 nm. The ITO/Ag/ITO transparent conductive glass substrates designed for low sheet resistance showed a sheet resistance of 4.5 Ω/□, with the average light transmittance exceeding 89% in the visible spectrum and more than 92% at a wavelength of 550 nm. ITO/Ag/AlN transparent conductive polyethylene terephthalate substrates designed for flexibility displayed a sheet resistance of 10.6 Ω/□ with a transmittance exceeding 88% at a wavelength of 550 nm.