Abstract
A theoretical analysis is given of ultimate-resolution imaging in optical lithography by off-axis illumination, a common approach to image quality improvement. On this basis, the optimization of light-source aperture configuration is addressed. The types of aperture considered are the circular dipole, the circular quadrupole, the simple annular aperture, the annular dipole, and the annular quadrupole. They are compared in terms of simultaneous transfer of transverse and longitudinal mask features.
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