Abstract

We present the design and analysis of three-terminal Ge1− x Sn x /Ge multiple-quantum-well (MQW) heterojunction phototransistors (HPTs) for high-performance short-wave infrared (SWIR) photodetection. The active layer incorporates Ge1− x Sn x /Ge MQW structures between base–collector junctions pseudomorphically grown on Ge-on-Si substrates, thereby providing compatibility with CMOS platforms for low cost and scalable manufacturing technology. Introducing Sn into the MQW structures can effectively reduce the direct bandgap, thereby considerably extending the photodetection range in the SWIR spectral range with improved absorption efficiencies. In addition, the use of MQW structures as the active layer can enhance the absorption coefficient via quantum-confinement effects, thus further enhancing the photoresponses. We develop theoretical models to calculate the strained electronic band structures and optical absorption coefficients for the Ge1− x Sn x /Ge MQW structures, and the current gain is evaluated as a function of the barrier/well thicknesses, number of periods of the MQW structures, and doping concentrations of the layers for the HPT structures. The calculation results show that the absorption coefficient can be significantly enhanced by increasing the Sn content in the Ge1− x Sn x /Ge MQW active layer, and the current gain can be considerably enhanced by optimizing the HPT structures. With the enhanced absorption coefficient and current gain, high-responsivity photodetection can be achieved in the SWIR spectral range, thus making this device very promising for a wide range of SWIR photodetection applications.

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