Abstract
A report is presented on the deposition of YBa/sub 2/Cu/sub 3/O/sub 7/ thin films onto epitaxial magnesia-coated single-crystal sapphire substrates at deposition temperatures in the range of 600 degrees C-850 degrees C. The dependence of film composition on sputtering parameters was investigated using a UHV DC magnetron sputter deposition system with both composite metal and ceramic oxide targets. Films deposited onto epitaxial magnesia are compared to those deposited directly onto sapphire and yttria-stabilized zirconia. The degree of control required for the sputter deposition of YBaCuO thin films at elevated temperatures is shown.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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