OPTIMIZATION OF THE HOLLOW CHANNELS FORMATION PARAMETERS INSIDE GLASS BY DIRECT LASER WRITING AND SELECTIVE ETCHING

Abstract

Two-stage method of hollow channels formation inside glass by direct laser writing and selective etching is perspective way for microfluidics devices manufacturing. In this work the influence of the etching solution concentration and laser writing conditions (the laser beam scanning speed, pulse energy) on the etching rate, selectivity and roughness of hollow channels in quartz glass is studied. The use of 1M NaOH makes it possible to increase the etching rate of hollow channels up to 300 µm/h while maintaining high selectivity up to 680.