Optimization of the 3D multi-level SOT-MRAMs

Abstract

With the development of electronic technology, semiconductor memory is gradually shifting toward smaller area with less power consumption. SOT-MRAM is one of the competitive substitutes for DRAM and SRAM due to its superior endurance and switching speed. In contrast to STT-MRAM, the separation of read and write routes allows SOT-MRAM to have a lower error rate and higher lifetime, but this comes at the expense of the memory density. In recent years, vertical integrated circuits have relied on TSV to complete 3D stacking to ease the pressure of Moore's Law on scaling circuits. SOT-MRAM can take advantage of 3D stacking to reduce power and latency. More importantly, the density of SOT-MRAM can be improved at the same time. In the paper, simulation is conducted based on DESTINY, with the TSV model supplemented to NVSIM to evaluate the performance of MRAM 3D structures. The 3D SOT-MRAM structure in DESTINY can be implemented with a bus layer and interconnect structure between layers, which greatly reduces the expense of area. However, the 3D structure requires a more complex interconnect structure to truly meet the requirements of high density. For this reason, 3D model of unit interconnection using TSV is presented in the paper. Memory has several components, of which the memory array is the one with the largest area share. This paper explores the spatial structure of the array and proposes a new model which allows more complex interconnect structures to be accomplished on the same area.