Abstract
We succeed in developing beneficial photoacid generator (PAG) for EUV exposure. In a high annealing type resist system in which poly-hydroxystyrene employed as a base resin, we found that sulfonium salts which employed cyclo(1,3-perfluoropropanedisulfone) imidate employed as a anion of PAG is more sensitive than perfluorobutanesulfonate employed as an anion of PAG under extreme ultraviolet (EUV) exposure. However, the sensitivities were different under EUV and electron beam (EB) exposures. It indicates that the distinctive acid production reaction is occurred under EUV exposure in comparing under EB exposure. As results of the time dependency mass spectroscopy and the Fourier Transform Infrared Spectroscopy (FT-IR), EUV induced reaction of cyclo(1,3-perfluoropropanedisulfone) imidate employed as an anion of PAG occurred more efficiently than that of perfluorobutanesulfonate employed as an anion of PAG.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
