Abstract
Efficient antireflection coatings (ARC) improve the light collection and thereby increase the current output of solar cells. In this work, multilayered refractive index stacks optimized for antireflection, in bare air and within modules, are modeled. The relation between porous silicon (PS) etching parameters and PS structure is carefully investigated using spectroscopic ellipsometry, gravimetry, x-ray photoelectron spectroscopy, and scanning electron microscopy. The close relation between porosity and refractive index, modeled using the Bruggeman effective medium approximation, allows PS multilayers to be tailored to fabricate the optimized ARCs. Limits imposed by efficient application in photovoltaics, such as thickness restrictions and the angular distribution of incident light, are examined and accounted for. Low reflectance multilayer ARCs are fabricated with integrated reflectances of ∼3% in air and 1.4% under glass in the wavelength range 400–1100 nm.
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