Optimization of Longitudinal Alignment of an 4f System in a Compact Vectorial Optical-Field Generator Based on a High-Resolution Liquid Crystal Spatial Light Modulator

Abstract

Vectorial optical fields have garnered significant attention due to their potential applications in areas such as optical nano-fabrication, optical micromachining, quantum information processing, optical imaging, and so on. Traditional compact vectorial optical generators with amplitude modulation perform poorly in terms of diffraction effect reduction. To tackle this problem, the refractive 4f system in amplitude modulation is longitudinally aligned using an optimization approach presented in this research. The phase images used for longitudinal alignment are loaded into the liquid crystal spatial light modulator (SLM), and the distance between the lens and the mirror in the reflective 4f system is adjusted for longitudinal alignment by compensating for the neglected phase in the integrated module for the compact vectorial optical-field generator. The spot images collected by the CCD are processed using the improved eight-direction Sobel operator and Roberts function, and the longitudinal alignment in the reflective 4f system is determined by the sharpness of the image. The sharpness of the edges of the lines and the overall image are both enhanced after optimization compared to before optimization. The results demonstrate that the proposed method can effectively reduce the longitudinal alignment error of the reflective 4f system in the amplitude modulation of the compact vectorial optical-field generator, lessen the diffraction effect, and improve the performance of the system.