Abstract
Screen-printed n +–p–p + solar cells were fabricated on Cz single crystalline Si material, with a 45 Ω/sq emitter and PECVD SiNx antireflective coating with a thickness of 700 Å, using different Ag pastes and commercial leaded reference paste (CN33-462, Ferro Corp.). Ag and Al contacts were co-fired using a mass-production line equipped with mesh belt conveyer furnace systems (Centrotherm thermal solution GmbH & Co. KG). The average results for single crystalline Si solar cells (156 cm 2) are: I sc=5.043 A, V oc=0.621 V, R s=0.0087 Ω, R sh=15.3 Ω, FF=0.773, and E ff=16.45%. R sh and fill factor values of fabricated cells were slightly higher when compared with the commercial leaded Ag paste, although cells were fabricated by metallizing the lead-free silver pastes. For the lead-free Ag paste used in this study, the line pattern continuity is retained with improved edge definition in sharp contrast to that of reference Ag paste. Average value of R s was also equivalent approximately to that of the leaded Ag paste.
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