Optimization of ICPCVD Amorphous Silicon for Optical MEMS Applications

Abstract

In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave infrared wavelengths (450–3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon-silicon oxide-silicon-based distributed Bragg reflectors were fabricated for the visible (500–700 nm), near infrared (700–1000 nm), and short-wave infrared (2000–3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical transmission spectra show close to 90% peak reflectivity. Finally, stress optimization was evaluated by fabricating $270-\mu \mathrm {m}$ diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of $ nm across the entire lateral dimension. [2015-0029]