Abstract
To improve the carrier confinement capability and optimize the performance of deep ultraviolet laser diodes (DUV-LDs), we propose the graded rectangular superlattice (GRSL) electron blocking layer (EBL) and the graded trapezoidal superlattice (GTSL) hole blocking layer (HBL) in this paper. Crosslight software is used to simulate and compare the DUV-LDs with rectangular superlattice (RSL) EBL and RSL HBL, GRSL EBL and GRSL HBL, and GRSL EBL and GTSL HBL. The simulation results indicate that GRSL EBL and GTSL HBL increase the carrier concentration in the quantum wells, reduce the electron leakage in the p-type region and the hole leakage in the n-type region, increase the radiation recombination rate, reduce the threshold voltage and threshold current, and increase the electro-optical conversion efficiency and output power of DUV-LDs more effectively.
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